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HJT反应式等离子体镀膜设备

设备名称 Equipment Name

HJT反应式等离子体镀膜设备  Reactive Plasma Deposition (RPD)


设备型号 Equipment Model

RPD5500A


设备优势 Advantages

高解离率离子、低轰击能量镀膜,不损伤衬底表面,保持良好的接口特性,薄膜的载子迁移率超高,经长期量产验证的精密镀膜技术。

High dissociation rate coating mechanism with almost no ion bombardment to maintain good interface characteristics where high carrier mobility can be reached in this reliable coating technology.


设备用途 Equipment Usage

制备透明导电薄膜。

Transparent Conductive Layer (TCO) coating.

设备工艺 Process

使用低能量高密度电子束升华靶材产生高解离率的离子镀着在衬底的表面

High free state target ions sublimated by low energy electron beam recombine on the substrate to form a high quality film


技术特点  Features

1、世界第一异质结太阳电池大厂唯一选用RPD设备。
The world top one heterojunction solar cell manufacturer only chooses RPD equipment.

2、高达80%以上铟解离率,成就高质量的透明导电膜(TCO)。
Up to 80% indium dissociation rate, achieving high quality transparent conductive film.

3、镀膜过程低于30eV离子轰击,不损伤非晶硅膜,保持良好接口特性。
The coating process is less than 30eV ion bombardment, does not damage the amorphous silicon film, and maintains good interface characteristics.

4、高载子迁移率与低载子浓度,确保优异导电性与高长波长透光率。
High carrier mobility and low carrier concentration ensure excellent conductivity and high long-wavelength transmittance.

5、靶材IWO载子迁移率高达80cm2/V·s,新材料ICO载子迁移率可高达130cm2/V·s。
IWO carrier mobility up to 80cm2/V.s, where ICO carrier mobility can be as high as 130cm2/V.s.

6、异质结厂商长期量产验证,采用RPD制备的电池效率比其他设备多0.4%。
Long-term mass production verification of HJT cell manufacturers, the conversion efficiency of HJT solar cell manufactured by RPD is 0.4% more than made by other equipment.

7、可依客户产线规划,提供直线型RPD设备与回路型RPD设备。

Linear type and loop type RPD equipment can be provided according to customer request.   


设备参数  Parameters